Patterning of 100 nm Features Using X-ray Lithography.

Sub-100 nm lithography using ultrashort wavelength of surface plasmons

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Towards Sub-100 Nm X-ray Microscopy for Tomographic Applications

We have demonstrated that structures down to 150 nm can be visualized in X-ray projection images using a nano-focus X-ray source. Due to their unlimited depth of focus, they don a limit on the specimen size in the case of 3D tomographic imaging. Further simulation studies have shown that optimization of the detector response curve and switching from a reflective Xray target to a transmission ta...

2. Microfabrication Using X- ray Lithography

Patterning Sub-30-nm MOSFET Gate with -Line Lithography

We have investigated two process techniques: resist ashing and oxide hard mask trimming. A combination of ashing and trimming produces sub-30-nm MOSFET gate. These techniques require neither specific equipment nor materials. These can be used to fabricate experimental devices with line width beyond the limit of optical lithography or high-throughput -beam lithography. They provide 25-nm gate pa...

An ultraviolet-curable mold for sub-100-nm lithography.

We describe a novel UV-curable mold that is stiff enough for replicating dense sub-100-nm features even with a high aspect ratio. It also allows for flexibility when the mold is prepared on a flexible support such that large area replication can be accomplished. The composite material of the mold is inert to chemicals and solvents. The surface energy is made low with a small amount of releasing...